Fabrication of High-Quality and Strain-Relaxed GeSn Microdisks by Integrating Selective Epitaxial Growth and Selective Wet Etching Methods.

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Bibliographic Details
Title: Fabrication of High-Quality and Strain-Relaxed GeSn Microdisks by Integrating Selective Epitaxial Growth and Selective Wet Etching Methods.
Authors: Zhu, Guangjian1, Liu, Tao1, Zhong, Zhenyang1, Yang, Xinju1, Wang, Liming2, lmwang@xidian.edu.cn, Jiang, Zuimin1, zmjiang@fudan.edu.cn
Source: Nanoscale Research Letters; 1/21/2020, Vol. 15 Issue 1, p1-7, 7p
Database: Applied Science & Technology Source
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ISSN:19317573
DOI:10.1186/s11671-020-3251-0