Improved thermal stability and contact of antimony film by the interlayer HfO2.
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| Title: | Improved thermal stability and contact of antimony film by the interlayer HfO2. |
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| Authors: | Xu, Junbo1, Hu, Yifeng1,2, hyf@jsut.edu.cn, Lai, Tianshu3, stslts@mail.sysu.edu.cn, Xu, Yongkang1, Sun, Song1 |
| Source: | Journal of Materials Science: Materials in Electronics; May2020, Vol. 31 Issue 10, p8052-8058, 7p |
| Database: | Applied Science & Technology Source |
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| ISSN: | 09574522 |
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| DOI: | 10.1007/s10854-020-03345-3 |
