APA (7th ed.) Citation

Xu, J., Hu, Y., Lai, T., Xu, Y., & Sun, S. (2020). Improved thermal stability and contact of antimony film by the interlayer HfO2. Journal of Materials Science: Materials in Electronics, 31(10), 8052. https://doi.org/10.1007/s10854-020-03345-3

Chicago Style (17th ed.) Citation

Xu, Junbo, Yifeng Hu, Tianshu Lai, Yongkang Xu, and Song Sun. "Improved Thermal Stability and Contact of Antimony Film by the Interlayer HfO2." Journal of Materials Science: Materials in Electronics 31, no. 10 (2020): 8052. https://doi.org/10.1007/s10854-020-03345-3.

MLA (9th ed.) Citation

Xu, Junbo, et al. "Improved Thermal Stability and Contact of Antimony Film by the Interlayer HfO2." Journal of Materials Science: Materials in Electronics, vol. 31, no. 10, 2020, p. 8052, https://doi.org/10.1007/s10854-020-03345-3.