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Effect of RF sputtering power and vacuum annealing on the properties of AZO thin films prepared from ceramic target in confocal configuration.

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Title: Effect of RF sputtering power and vacuum annealing on the properties of AZO thin films prepared from ceramic target in confocal configuration.
Authors: Challali, Fatiha1, fatiha.challali@univ-paris13.fr, Mendil, Djelloul2,3, Touam, Tahar2,3, Chauveau, Thierry1, Bockelée, Valérie1, Sanchez, Alexis Garcia1, Chelouche, Azeddine4, Besland, Marie-Paule5
Source: Materials Science in Semiconductor Processing; Nov2020, Vol. 118, pN.PAG-N.PAG, 1p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 144751747
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Effect of RF sputtering power and vacuum annealing on the properties of AZO thin films prepared from ceramic target in confocal configuration.
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PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=144751747
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1016/j.mssp.2020.105217
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      – Code: eng
        Text: English
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        PageCount: 1
        StartPage: N.PAG
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      – TitleFull: Effect of RF sputtering power and vacuum annealing on the properties of AZO thin films prepared from ceramic target in confocal configuration.
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            NameFull: Challali, Fatiha
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            NameFull: Mendil, Djelloul
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            NameFull: Touam, Tahar
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            NameFull: Chauveau, Thierry
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            NameFull: Bockelée, Valérie
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            NameFull: Sanchez, Alexis Garcia
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            NameFull: Besland, Marie-Paule
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            – D: 01
              M: 11
              Text: Nov2020
              Type: published
              Y: 2020
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              Value: 118
          Titles:
            – TitleFull: Materials Science in Semiconductor Processing
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