Analysis of perovskite oxide etching using argon inductively coupled plasmas for photonics applications.

Saved in:
Bibliographic Details
Title: Analysis of perovskite oxide etching using argon inductively coupled plasmas for photonics applications.
Authors: Chen, Guanyu1, Cheung, Eric Jun Hao1, Cao, Yu1, Pan, Jisheng2, Danner, Aaron J.1, adanner@nus.edu.sg
Source: Nanoscale Research Letters; 2/10/2021, Vol. 16 Issue 1, p1-9, 9p
Database: Applied Science & Technology Source
Full text is not displayed to guests.
Description
ISSN:19317573
DOI:10.1186/s11671-021-03494-2