Effect of TiO2 compact layer and ITO texturing on DSSC efficiency improvement by chemical deposition and etching process.
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| Title: | Effect of TiO2 compact layer and ITO texturing on DSSC efficiency improvement by chemical deposition and etching process. |
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| Authors: | Ho, Ying-Rong1, Lin, Ching-Huang2, Huang, Jung-Jie3, jjhuang@mail.dyu.edu.tw |
| Source: | Journal of Materials Science: Materials in Electronics; Jan2021, Vol. 32 Issue 2, p2618-2626, 9p |
| Database: | Applied Science & Technology Source |
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| ISSN: | 09574522 |
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| DOI: | 10.1007/s10854-020-05029-4 |
