Effect of TiO2 compact layer and ITO texturing on DSSC efficiency improvement by chemical deposition and etching process.

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Title: Effect of TiO2 compact layer and ITO texturing on DSSC efficiency improvement by chemical deposition and etching process.
Authors: Ho, Ying-Rong1, Lin, Ching-Huang2, Huang, Jung-Jie3, jjhuang@mail.dyu.edu.tw
Source: Journal of Materials Science: Materials in Electronics; Jan2021, Vol. 32 Issue 2, p2618-2626, 9p
Database: Applied Science & Technology Source
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DbLabel: Applied Science & Technology Source
An: 148892427
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PubType: Academic Journal
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  Data: Effect of TiO2 compact layer and ITO texturing on DSSC efficiency improvement by chemical deposition and etching process.
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PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=148892427
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1007/s10854-020-05029-4
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      – Code: eng
        Text: English
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        PageCount: 9
        StartPage: 2618
    Titles:
      – TitleFull: Effect of TiO2 compact layer and ITO texturing on DSSC efficiency improvement by chemical deposition and etching process.
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          Name:
            NameFull: Ho, Ying-Rong
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            NameFull: Lin, Ching-Huang
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            NameFull: Huang, Jung-Jie
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            – D: 15
              M: 01
              Text: Jan2021
              Type: published
              Y: 2021
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              Value: 32
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              Value: 2
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            – TitleFull: Journal of Materials Science: Materials in Electronics
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