Effect of oxygen annealing temperature on properties of spatial atomic layer deposited aluminum-doped zinc oxide films.
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| Title: | Effect of oxygen annealing temperature on properties of spatial atomic layer deposited aluminum-doped zinc oxide films. |
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| Authors: | Hsu, Chia-Hsun1,2, Geng, Xin-Peng1, Wu, Wan-Yu3, Zhao, Ming-Jie1, Huang, Pao-Hsun2, Zhang, Xiao-Ying1, Su, Zhan-Bo1, Chen, Zi-Rong1, Lien, Shui-Yang1,3,4, sylien@xmut.edu.cn |
| Source: | Materials Science in Semiconductor Processing; Oct2021, Vol. 133, pN.PAG-N.PAG, 1p |
| Database: | Applied Science & Technology Source |
| ISSN: | 13698001 |
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| DOI: | 10.1016/j.mssp.2021.105929 |
