Controllable Si oxidation mediated by annealing temperature and atmosphere.
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| Title: | Controllable Si oxidation mediated by annealing temperature and atmosphere. |
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| Authors: | Li, Feitao1, Wang, Dong1, dong.wang@tu-ilmenau.de, Klingenhof, Malte2, Flock, Dominik1, Wang, Honglei1, Strasser, Peter2, Schaaf, Peter1 |
| Source: | Journal of Materials Science; Jun2022, Vol. 57 Issue 24, p10943-10952, 10p, 2 Color Photographs, 2 Black and White Photographs, 1 Diagram |
| Database: | Applied Science & Technology Source |
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| ISSN: | 00222461 |
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| DOI: | 10.1007/s10853-022-07354-x |