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Controllable Si oxidation mediated by annealing temperature and atmosphere.

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Title: Controllable Si oxidation mediated by annealing temperature and atmosphere.
Authors: Li, Feitao1, Wang, Dong1, dong.wang@tu-ilmenau.de, Klingenhof, Malte2, Flock, Dominik1, Wang, Honglei1, Strasser, Peter2, Schaaf, Peter1
Source: Journal of Materials Science; Jun2022, Vol. 57 Issue 24, p10943-10952, 10p, 2 Color Photographs, 2 Black and White Photographs, 1 Diagram
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 157613909
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Materials+Science%22">Journal of Materials Science</searchLink>; Jun2022, Vol. 57 Issue 24, p10943-10952, 10p, 2 Color Photographs, 2 Black and White Photographs, 1 Diagram
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1007/s10853-022-07354-x
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      – Code: eng
        Text: English
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        PageCount: 10
        StartPage: 10943
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      – TitleFull: Controllable Si oxidation mediated by annealing temperature and atmosphere.
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            NameFull: Li, Feitao
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            NameFull: Wang, Dong
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            NameFull: Klingenhof, Malte
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            NameFull: Flock, Dominik
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            NameFull: Wang, Honglei
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            NameFull: Strasser, Peter
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            – D: 18
              M: 06
              Text: Jun2022
              Type: published
              Y: 2022
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              Value: 57
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            – TitleFull: Journal of Materials Science
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