Proximity-Induced Magnetism in a Topological Insulator/Half-Metallic Ferromagnetic Thin Film Heterostructure.

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Bibliographic Details
Title: Proximity-Induced Magnetism in a Topological Insulator/Half-Metallic Ferromagnetic Thin Film Heterostructure.
Authors: Zhang, Min1, llg@126.comzmzmi1987@cwnu.edu.cn, Liu, Qiya2, liuqiya_xhsx@163.com, Liu, Ligang1, Zeng, Tixian3, zengtxnc@163.com
Source: Coatings (2079-6412); Jun2022, Vol. 12 Issue 6, p750-N.PAG, 13p
Database: Applied Science & Technology Source
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ISSN:20796412
DOI:10.3390/coatings12060750