Bibliographic Details
| Title: |
Ultralow‐k Amorphous Boron Nitride Based on Hexagonal Ring Stacking Framework for 300 mm Silicon Technology Platform. |
| Authors: |
Lin, Cheng‐Ming1, Hsu, Chuang‐Han1, Huang, Wei‐Yu2, Astié, Vincent3, Cheng, Po‐Hsien1, Lin, Yue‐Min1, Hu, Wei‐Shan1, Chen, Szu‐Hua1, Lin, Han‐Yu1, Li, Ming‐Yang1, Magyari‐Kope, Blanka1, Yang, Chi‐Ming1, Decams, Jean‐Manuel3, Lee, Tzu‐Lih1, Gui, Dong1, Wang, Han1, Woon, Wei‐Yen1,2, wywoon@phy.ncu.edu.tw, Lin, Pinyen1, Wu, Jeff1, Lee, Jang‐Jung1 |
| Source: |
Advanced Materials Technologies; Oct2022, Vol. 7 Issue 10, p1-8, 8p |
| Database: |
Applied Science & Technology Source |
