Evolution of the thermal behavior and complexity of end-of-range defects in silicon pre-amorphized by Ge+ implantation.
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| Title: | Evolution of the thermal behavior and complexity of end-of-range defects in silicon pre-amorphized by Ge+ implantation. |
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| Authors: | Belafhaili, Amine1, a.belafhaili@um5r.ac.ma, Laanab, Larbi2 |
| Source: | Journal of Materials Science: Materials in Electronics; Feb2023, Vol. 34 Issue 5, p1-6, 6p |
| Database: | Applied Science & Technology Source |
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| ISSN: | 09574522 |
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| DOI: | 10.1007/s10854-022-09794-2 |
