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Heterostructure Films of SiO 2 and HfO 2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition.

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Title: Heterostructure Films of SiO 2 and HfO 2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition.
Authors: Alam, Shawon1,2, Paul, Pallabi1,2, Beladiya, Vivek1,2, Schmitt, Paul1,2, Stenzel, Olaf2, Trost, Marcus2, Wilbrandt, Steffen2, Mühlig, Christian2, Schröder, Sven2, Matthäus, Gabor1, Nolte, Stefan1,2, Riese, Sebastian3, Otto, Felix4, Fritz, Torsten4, Gottwald, Alexander5, Szeghalmi, Adriana1,2, adriana.szeghalmi@iof.fraunhofer.de
Source: Coatings (2079-6412); Feb2023, Vol. 13 Issue 2, p278, 23p
Database: Applied Science & Technology Source
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ISSN:20796412
DOI:10.3390/coatings13020278