APA (7th ed.) Citation

Alam, S., Paul, P., Beladiya, V., Schmitt, P., Stenzel, O., Trost, M., . . . Szeghalmi, A. (2023). Heterostructure Films of SiO 2 and HfO 2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition. Coatings (2079-6412), 13(2), 278. https://doi.org/10.3390/coatings13020278

Chicago Style (17th ed.) Citation

Alam, Shawon, et al. "Heterostructure Films of SiO 2 and HfO 2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition." Coatings (2079-6412) 13, no. 2 (2023): 278. https://doi.org/10.3390/coatings13020278.

MLA (9th ed.) Citation

Alam, Shawon, et al. "Heterostructure Films of SiO 2 and HfO 2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition." Coatings (2079-6412), vol. 13, no. 2, 2023, p. 278, https://doi.org/10.3390/coatings13020278.