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Heterostructure Films of SiO 2 and HfO 2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition.

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Bibliographic Details
Title:	Heterostructure Films of SiO 2 and HfO 2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition.
Authors:	Alam, Shawon^1,2, Paul, Pallabi^1,2, Beladiya, Vivek^1,2, Schmitt, Paul^1,2, Stenzel, Olaf², Trost, Marcus², Wilbrandt, Steffen², Mühlig, Christian², Schröder, Sven², Matthäus, Gabor¹, Nolte, Stefan^1,2, Riese, Sebastian³, Otto, Felix⁴, Fritz, Torsten⁴, Gottwald, Alexander⁵, Szeghalmi, Adriana^1,2, adriana.szeghalmi@iof.fraunhofer.de
Source:	Coatings (2079-6412); Feb2023, Vol. 13 Issue 2, p278, 23p
Database:	Applied Science & Technology Source
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