A framework for combined simulations of electromigration induced stress evolution, void nucleation, and its dynamics: Application to nano-interconnect reliability.
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| Title: | A framework for combined simulations of electromigration induced stress evolution, void nucleation, and its dynamics: Application to nano-interconnect reliability. |
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| Authors: | Saleh, A. S.1,2, Croes, K.2, Ceric, H.3, De Wolf, I.1,2, Zahedmanesh, H.2, Houman.Zahedmanesh@imec.be |
| Source: | Journal of Applied Physics; 10/7/2023, Vol. 134 Issue 13, p1-12, 12p |
| Database: | Applied Science & Technology Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 172853897 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=172853897 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1063/5.0165949 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 12 StartPage: 1 Titles: – TitleFull: A framework for combined simulations of electromigration induced stress evolution, void nucleation, and its dynamics: Application to nano-interconnect reliability. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Saleh, A. S. – PersonEntity: Name: NameFull: Croes, K. – PersonEntity: Name: NameFull: Ceric, H. – PersonEntity: Name: NameFull: De Wolf, I. – PersonEntity: Name: NameFull: Zahedmanesh, H. IsPartOfRelationships: – BibEntity: Dates: – D: 07 M: 10 Text: 10/7/2023 Type: published Y: 2023 Identifiers: – Type: issn-print Value: 00218979 Numbering: – Type: volume Value: 134 – Type: issue Value: 13 Titles: – TitleFull: Journal of Applied Physics Type: main |
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