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Growth mechanism and characterization of chemical oxide films produced in peroxide mixtures on Si(100) surfaces

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Title: Growth mechanism and characterization of chemical oxide films produced in peroxide mixtures on Si(100) surfaces
Authors: Petitdidier, S.1, Bertagna, V.2, valerie.bertagna@univ-orleans.fr, Rochat, N.3, Rouchon, D.3, Besson, P.1, Erre, R.2, Chemla, M.4
Source: Thin Solid Films; Apr2005, Vol. 476 Issue 1, p51-58, 8p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 17426290
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Growth mechanism and characterization of chemical oxide films produced in peroxide mixtures on Si(100) surfaces
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PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=17426290
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1016/j.tsf.2004.09.008
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      – Code: eng
        Text: English
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        PageCount: 8
        StartPage: 51
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      – TitleFull: Growth mechanism and characterization of chemical oxide films produced in peroxide mixtures on Si(100) surfaces
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              Text: Apr2005
              Type: published
              Y: 2005
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