Impact of deposition temperature on electrical properties of HZO-based FeRAM.
Saved in:
| Title: | Impact of deposition temperature on electrical properties of HZO-based FeRAM. |
|---|---|
| Authors: | Yeh, Yu-Hsuan1, Tan, Yung-Fang2, Huang, Yen-Che2, Lin, Chao Cheng3, Wu, Chung-Wei1, Zhang, Yong-Ci2, Lee, Ya-Huan1, Chang, Ting-Chang4, tcchang3708@gmail.com, Sze, Simon M.5 |
| Source: | Journal of Applied Physics; 2/14/2024, Vol. 135 Issue 6, p1-6, 6p |
| Database: | Applied Science & Technology Source |
| FullText | Text: Availability: 0 |
|---|---|
| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 175451349 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
| IllustrationInfo | |
| Items | – Name: Title Label: Title Group: Ti Data: Impact of deposition temperature on electrical properties of HZO-based FeRAM. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AU" term="%22Yeh%2C+Yu-Hsuan%22">Yeh, Yu-Hsuan</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Tan%2C+Yung-Fang%22">Tan, Yung-Fang</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Huang%2C+Yen-Che%22">Huang, Yen-Che</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Lin%2C+Chao+Cheng%22">Lin, Chao Cheng</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Wu%2C+Chung-Wei%22">Wu, Chung-Wei</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Zhang%2C+Yong-Ci%22">Zhang, Yong-Ci</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Lee%2C+Ya-Huan%22">Lee, Ya-Huan</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Chang%2C+Ting-Chang%22">Chang, Ting-Chang</searchLink><relatesTo>4</relatesTo>, <i>tcchang3708@gmail.com</i><br /><searchLink fieldCode="AU" term="%22Sze%2C+Simon+M%2E%22">Sze, Simon M.</searchLink><relatesTo>5</relatesTo> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; 2/14/2024, Vol. 135 Issue 6, p1-6, 6p |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=175451349 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1063/5.0184841 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 6 StartPage: 1 Titles: – TitleFull: Impact of deposition temperature on electrical properties of HZO-based FeRAM. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Yeh, Yu-Hsuan – PersonEntity: Name: NameFull: Tan, Yung-Fang – PersonEntity: Name: NameFull: Huang, Yen-Che – PersonEntity: Name: NameFull: Lin, Chao Cheng – PersonEntity: Name: NameFull: Wu, Chung-Wei – PersonEntity: Name: NameFull: Zhang, Yong-Ci – PersonEntity: Name: NameFull: Lee, Ya-Huan – PersonEntity: Name: NameFull: Chang, Ting-Chang – PersonEntity: Name: NameFull: Sze, Simon M. IsPartOfRelationships: – BibEntity: Dates: – D: 14 M: 02 Text: 2/14/2024 Type: published Y: 2024 Identifiers: – Type: issn-print Value: 00218979 Numbering: – Type: volume Value: 135 – Type: issue Value: 6 Titles: – TitleFull: Journal of Applied Physics Type: main |
| ResultId | 1 |