Bibliographic Details
| Title: |
Analysis of ferroelectric properties of ALD-Hf0.5Zr0.5O2 thin films according to oxygen sources. |
| Authors: |
Lee, Seungbin1, Jung, Yong Chan2, Park, Hye Ryeon3, Park, Seongbin1, Kang, Jongmug3, Jeong, Juntak3, Choi, Yeseo1, Kim, Jin-Hyun2, Mohan, Jaidah2, Kim, Harrison Sejoon2, Kim, Jiyoung1,2, jiyoung.kim@utdallas.edu, Kim, Si Joon1,3, sijoon.kim@kangwon.ac.kr |
| Source: |
Solid-State Electronics; Jun2024, Vol. 216, pN.PAG-N.PAG, 1p |
| Database: |
Applied Science & Technology Source |
