The Effect of Deposition Temperature on TiN Thin Films for the Electrode Layer of 3D Capacitors Prepared by Atomic Layer Deposition.

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Title: The Effect of Deposition Temperature on TiN Thin Films for the Electrode Layer of 3D Capacitors Prepared by Atomic Layer Deposition.
Authors: Chen, Xingyu1,2, Zhang, Jing2,3, Gao, Lingshan2, gaolingshan@mail.sic.ac.cn, Zhang, Faqiang2, Ma, Mingsheng2,3, Liu, Zhifu1,2,3, gaolingshan@mail.sic.ac.cn
Source: Coatings (2079-6412); Jun2024, Vol. 14 Issue 6, p724, 14p
Database: Applied Science & Technology Source
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DbLabel: Applied Science & Technology Source
An: 178157253
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  Data: The Effect of Deposition Temperature on TiN Thin Films for the Electrode Layer of 3D Capacitors Prepared by Atomic Layer Deposition.
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.3390/coatings14060724
    Languages:
      – Code: eng
        Text: English
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      Pagination:
        PageCount: 14
        StartPage: 724
    Titles:
      – TitleFull: The Effect of Deposition Temperature on TiN Thin Films for the Electrode Layer of 3D Capacitors Prepared by Atomic Layer Deposition.
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          Name:
            NameFull: Chen, Xingyu
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            NameFull: Zhang, Jing
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            NameFull: Gao, Lingshan
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            NameFull: Zhang, Faqiang
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            NameFull: Ma, Mingsheng
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            NameFull: Liu, Zhifu
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            – D: 01
              M: 06
              Text: Jun2024
              Type: published
              Y: 2024
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              Value: 20796412
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              Value: 14
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              Value: 6
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            – TitleFull: Coatings (2079-6412)
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