Mixed etching-oxidation process to enhance the performance of spin-transfer torque MRAM for high-performance computing.

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Title: Mixed etching-oxidation process to enhance the performance of spin-transfer torque MRAM for high-performance computing.
Authors: Chen, Kuan-Ming1, Lo, Chiao-Yun2, Chiu, Shih-Ching2, Su, Yi-Hui2, Chang, Yao-Jen2, Chen, Guan-Long2, Lee, Hsin-Han2, Huang, Xin-Yo2, Shih, Cheng-Yi2, Wang, Chih-Yao2, Wang, I-Jung2, Yang, Shan-Yi2, Hsin, Yu-Chen2, Wei, Jeng-Hua2, Sheu, Shyh-Shyuan2, Lo, Wei-Chung2, Chang, Shih-Chieh2, Tseng, Yuan-Chieh1, yctseng1978@nycu.edu.tw
Source: Applied Physics Letters; 7/1/2024, Vol. 125 Issue 1, p1-5, 5p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 178228178
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PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Mixed etching-oxidation process to enhance the performance of spin-transfer torque MRAM for high-performance computing.
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  Data: <searchLink fieldCode="JN" term="%22Applied+Physics+Letters%22">Applied Physics Letters</searchLink>; 7/1/2024, Vol. 125 Issue 1, p1-5, 5p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=178228178
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        Value: 10.1063/5.0217921
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              Text: 7/1/2024
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