View in EDS

Optimization of surface filtration to enhance wafer uniformity by removing large particle in ceria slurry.

Saved in:
Bibliographic Details
Title: Optimization of surface filtration to enhance wafer uniformity by removing large particle in ceria slurry.
Authors: Oh, Seungjun1, Back, Geumji1,2, Park, Sanghyeon1, Lee, HunWook3, Seo, Heedo3, Kim, Yoonsub3, Kim, Taesung1,2,4, tkim@skku.edu
Source: Materials Science in Semiconductor Processing; Nov2024, Vol. 183, pN.PAG-N.PAG, 1p
Database: Applied Science & Technology Source
FullText Text:
  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 179502605
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
Items – Name: Title
  Label: Title
  Group: Ti
  Data: Optimization of surface filtration to enhance wafer uniformity by removing large particle in ceria slurry.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AU" term="%22Oh%2C+Seungjun%22">Oh, Seungjun</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Back%2C+Geumji%22">Back, Geumji</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AU" term="%22Park%2C+Sanghyeon%22">Park, Sanghyeon</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Lee%2C+HunWook%22">Lee, HunWook</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Seo%2C+Heedo%22">Seo, Heedo</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Kim%2C+Yoonsub%22">Kim, Yoonsub</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Kim%2C+Taesung%22">Kim, Taesung</searchLink><relatesTo>1,2,4</relatesTo>, <i>tkim@skku.edu</i>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Materials+Science+in+Semiconductor+Processing%22">Materials Science in Semiconductor Processing</searchLink>; Nov2024, Vol. 183, pN.PAG-N.PAG, 1p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=179502605
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1016/j.mssp.2024.108740
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 1
        StartPage: N.PAG
    Titles:
      – TitleFull: Optimization of surface filtration to enhance wafer uniformity by removing large particle in ceria slurry.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Oh, Seungjun
      – PersonEntity:
          Name:
            NameFull: Back, Geumji
      – PersonEntity:
          Name:
            NameFull: Park, Sanghyeon
      – PersonEntity:
          Name:
            NameFull: Lee, HunWook
      – PersonEntity:
          Name:
            NameFull: Seo, Heedo
      – PersonEntity:
          Name:
            NameFull: Kim, Yoonsub
      – PersonEntity:
          Name:
            NameFull: Kim, Taesung
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 15
              M: 11
              Text: Nov2024
              Type: published
              Y: 2024
          Identifiers:
            – Type: issn-print
              Value: 13698001
          Numbering:
            – Type: volume
              Value: 183
          Titles:
            – TitleFull: Materials Science in Semiconductor Processing
              Type: main
ResultId 1