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POSS and PAG Dual-Containing Chemically Amplified Photoresists by RAFT Polymerization for Enhanced Thermal Performance and Acid Diffusion Inhibition.

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Title: POSS and PAG Dual-Containing Chemically Amplified Photoresists by RAFT Polymerization for Enhanced Thermal Performance and Acid Diffusion Inhibition.
Authors: Yu, Haimeng1, Liu, Shaoshuai1, Fu, Haiyan1, Cui, Zepeng1, Zhang, Liangshun1, Tian, Jia1, tianjia@ecust.edu.cn
Source: Applied Sciences (2076-3417); Sep2024, Vol. 14 Issue 17, p7722, 15p
Database: Applied Science & Technology Source
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ISSN:20763417
DOI:10.3390/app14177722