APA (7th ed.) Citation

Yu, H., Liu, S., Fu, H., Cui, Z., Zhang, L., & Tian, J. (2024). POSS and PAG Dual-Containing Chemically Amplified Photoresists by RAFT Polymerization for Enhanced Thermal Performance and Acid Diffusion Inhibition. Applied Sciences (2076-3417), 14(17), 7722. https://doi.org/10.3390/app14177722

Chicago Style (17th ed.) Citation

Yu, Haimeng, Shaoshuai Liu, Haiyan Fu, Zepeng Cui, Liangshun Zhang, and Jia Tian. "POSS and PAG Dual-Containing Chemically Amplified Photoresists by RAFT Polymerization for Enhanced Thermal Performance and Acid Diffusion Inhibition." Applied Sciences (2076-3417) 14, no. 17 (2024): 7722. https://doi.org/10.3390/app14177722.

MLA (9th ed.) Citation

Yu, Haimeng, et al. "POSS and PAG Dual-Containing Chemically Amplified Photoresists by RAFT Polymerization for Enhanced Thermal Performance and Acid Diffusion Inhibition." Applied Sciences (2076-3417), vol. 14, no. 17, 2024, p. 7722, https://doi.org/10.3390/app14177722.