View in EDS HTML Full Text PDF Full Text

POSS and PAG Dual-Containing Chemically Amplified Photoresists by RAFT Polymerization for Enhanced Thermal Performance and Acid Diffusion Inhibition.

Saved in:
Bibliographic Details
Title: POSS and PAG Dual-Containing Chemically Amplified Photoresists by RAFT Polymerization for Enhanced Thermal Performance and Acid Diffusion Inhibition.
Authors: Yu, Haimeng1, Liu, Shaoshuai1, Fu, Haiyan1, Cui, Zepeng1, Zhang, Liangshun1, Tian, Jia1, tianjia@ecust.edu.cn
Source: Applied Sciences (2076-3417); Sep2024, Vol. 14 Issue 17, p7722, 15p
Database: Applied Science & Technology Source
Full text is not displayed to guests.
FullText Links:
  – Type: pdflink
Text:
  Availability: 1
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 179650245
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
Items – Name: Title
  Label: Title
  Group: Ti
  Data: POSS and PAG Dual-Containing Chemically Amplified Photoresists by RAFT Polymerization for Enhanced Thermal Performance and Acid Diffusion Inhibition.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AU" term="%22Yu%2C+Haimeng%22">Yu, Haimeng</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Liu%2C+Shaoshuai%22">Liu, Shaoshuai</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Fu%2C+Haiyan%22">Fu, Haiyan</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Cui%2C+Zepeng%22">Cui, Zepeng</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Zhang%2C+Liangshun%22">Zhang, Liangshun</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Tian%2C+Jia%22">Tian, Jia</searchLink><relatesTo>1</relatesTo>, <i>tianjia@ecust.edu.cn</i>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Applied+Sciences+%282076-3417%29%22">Applied Sciences (2076-3417)</searchLink>; Sep2024, Vol. 14 Issue 17, p7722, 15p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=179650245
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.3390/app14177722
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 15
        StartPage: 7722
    Titles:
      – TitleFull: POSS and PAG Dual-Containing Chemically Amplified Photoresists by RAFT Polymerization for Enhanced Thermal Performance and Acid Diffusion Inhibition.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Yu, Haimeng
      – PersonEntity:
          Name:
            NameFull: Liu, Shaoshuai
      – PersonEntity:
          Name:
            NameFull: Fu, Haiyan
      – PersonEntity:
          Name:
            NameFull: Cui, Zepeng
      – PersonEntity:
          Name:
            NameFull: Zhang, Liangshun
      – PersonEntity:
          Name:
            NameFull: Tian, Jia
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 09
              Text: Sep2024
              Type: published
              Y: 2024
          Identifiers:
            – Type: issn-print
              Value: 20763417
          Numbering:
            – Type: volume
              Value: 14
            – Type: issue
              Value: 17
          Titles:
            – TitleFull: Applied Sciences (2076-3417)
              Type: main
ResultId 1