Effects of implementing dual-step nitrogen ambient for growth and post-deposition annealing of Ga2O3 films sputtered on silicon.

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Bibliographic Details
Title: Effects of implementing dual-step nitrogen ambient for growth and post-deposition annealing of Ga2O3 films sputtered on silicon.
Authors: Mohammed, Alghareeb Abbas Abdulhussein1,2, Lim, Way Foong1, way_foong@usm.my
Source: Journal of Materials Science: Materials in Electronics; Sep2024, Vol. 35 Issue 26, p1-20, 20p
Database: Applied Science & Technology Source
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ISSN:09574522
DOI:10.1007/s10854-024-13488-2