Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor.
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| Title: | Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor. |
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| Authors: | Lee, Sanghun1, Han, Sanghee1, Kim, Jaehyeon1, Jeon, Minsung2, Chae, Heeyeop1,2, hchae@skku.edu |
| Source: | Plasma Chemistry & Plasma Processing; Nov2024, Vol. 44 Issue 6, p2247-2262, 16p |
| Database: | Applied Science & Technology Source |
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| ISSN: | 02724324 |
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| DOI: | 10.1007/s11090-024-10498-0 |
