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Carbon-Phenolic Ablators Modified by Ceramic Nanofilms Deposited via Atomic Layer Deposition (ALD) Technique.

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Bibliographic Details
Title: Carbon-Phenolic Ablators Modified by Ceramic Nanofilms Deposited via Atomic Layer Deposition (ALD) Technique.
Authors: Bottacchiari, Rita1, laura.paglia@uniroma1.itrita.bottacchiari@uniroma1.it, Borgese, Laura2, laura.borgese@unibs.it, Paglia, Laura1, giulia.pedrizzetti@uniroma1.it, Pedrizzetti, Giulia1, francesco.marra@uniroma1.it, Marra, Francesco1, giovanni.pulci@uniroma1.it, Pulci, Giovanni1
Source: Coatings (2079-6412); Dec2024, Vol. 14 Issue 12, p1551, 12p
Database: Applied Science & Technology Source
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ISSN:20796412
DOI:10.3390/coatings14121551