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Carbon-Phenolic Ablators Modified by Ceramic Nanofilms Deposited via Atomic Layer Deposition (ALD) Technique.

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Title: Carbon-Phenolic Ablators Modified by Ceramic Nanofilms Deposited via Atomic Layer Deposition (ALD) Technique.
Authors: Bottacchiari, Rita1, laura.paglia@uniroma1.itrita.bottacchiari@uniroma1.it, Borgese, Laura2, laura.borgese@unibs.it, Paglia, Laura1, giulia.pedrizzetti@uniroma1.it, Pedrizzetti, Giulia1, francesco.marra@uniroma1.it, Marra, Francesco1, giovanni.pulci@uniroma1.it, Pulci, Giovanni1
Source: Coatings (2079-6412); Dec2024, Vol. 14 Issue 12, p1551, 12p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 181951680
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Carbon-Phenolic Ablators Modified by Ceramic Nanofilms Deposited via Atomic Layer Deposition (ALD) Technique.
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  Data: <searchLink fieldCode="JN" term="%22Coatings+%282079-6412%29%22">Coatings (2079-6412)</searchLink>; Dec2024, Vol. 14 Issue 12, p1551, 12p
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        Value: 10.3390/coatings14121551
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      – Code: eng
        Text: English
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        PageCount: 12
        StartPage: 1551
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      – TitleFull: Carbon-Phenolic Ablators Modified by Ceramic Nanofilms Deposited via Atomic Layer Deposition (ALD) Technique.
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            NameFull: Pulci, Giovanni
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              M: 12
              Text: Dec2024
              Type: published
              Y: 2024
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