Growth and characterization of SiGe/Si superlattice for vertically stacked DRAM.

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Bibliographic Details
Title: Growth and characterization of SiGe/Si superlattice for vertically stacked DRAM.
Authors: Wang, Hailing1, Wang, Xiangsheng1, Song, Yanpeng1, Liu, Xiaomeng1, Zhang, Ying1, Liu, Xinyou1, Wang, Guilei1, guilei.wang@bjsamt.org.cn, Zhao, Chao1, chao.zhao@bjsamt.org.cn
Source: Journal of Materials Science: Materials in Electronics; Jan2025, Vol. 36 Issue 2, p1-11, 11p
Database: Applied Science & Technology Source
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ISSN:09574522
DOI:10.1007/s10854-024-14167-y