Interfacial and electrical characterizations of PEALD-grown AlN/4H-SiC MOS structure: a type-I heterojunction for enhanced blocking performance.

Saved in:
Bibliographic Details
Title: Interfacial and electrical characterizations of PEALD-grown AlN/4H-SiC MOS structure: a type-I heterojunction for enhanced blocking performance.
Authors: Guo, Yun-Duo1,2, Wang, An-Feng1,2, Huang, Qi-Min1,2, Wang, Zhen-Yu1,2, Ma, Hong-Ping1,2,3, hpma@fudan.edu.cn, Zhang, Qing-Chun1,2,3
Source: Journal of Materials Science: Materials in Electronics; Jan2025, Vol. 36 Issue 3, p1-16, 16p
Database: Applied Science & Technology Source
Full text is not displayed to guests.
Description
ISSN:09574522
DOI:10.1007/s10854-025-14273-5