Interfacial and electrical characterizations of PEALD-grown AlN/4H-SiC MOS structure: a type-I heterojunction for enhanced blocking performance.
Saved in:
| Title: | Interfacial and electrical characterizations of PEALD-grown AlN/4H-SiC MOS structure: a type-I heterojunction for enhanced blocking performance. |
|---|---|
| Authors: | Guo, Yun-Duo1,2, Wang, An-Feng1,2, Huang, Qi-Min1,2, Wang, Zhen-Yu1,2, Ma, Hong-Ping1,2,3, hpma@fudan.edu.cn, Zhang, Qing-Chun1,2,3 |
| Source: | Journal of Materials Science: Materials in Electronics; Jan2025, Vol. 36 Issue 3, p1-16, 16p |
| Database: | Applied Science & Technology Source |
|
Full text is not displayed to guests.
Login for full access.
|
|
| ISSN: | 09574522 |
|---|---|
| DOI: | 10.1007/s10854-025-14273-5 |