Bibliographic Details
| Title: |
Thermal budget study to simultaneously achieve low-temperature (<400 °C) process and high endurance of ferroelectric Hf0.5Zr0.5O2 thin films. |
| Authors: |
Kang, Jongmug1, Park, Seongbin2, Park, Hye Ryeon1, Lee, Seungbin2, Kim, Jin-Hyun3, Lee, Minjong4, Narayan, Dushyant M.3, Yoo, Jeong Gyu2, Park, Geon3,5,6, Kim, Harrison Sejoon3, Jung, Yong Chan3, Choi, Rino5,6, Kim, Jiyoung3,4, jiyoung.kim@utdallas.edu, Kim, Si Joon1,2, sijoon.kim@kangwon.ac.kr |
| Source: |
Applied Physics Letters; 3/8/2025, Vol. 126 Issue 10, p1-6, 6p |
| Database: |
Applied Science & Technology Source |
