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Thermal budget study to simultaneously achieve low-temperature (<400 °C) process and high endurance of ferroelectric Hf0.5Zr0.5O2 thin films.

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Title: Thermal budget study to simultaneously achieve low-temperature (<400 °C) process and high endurance of ferroelectric Hf0.5Zr0.5O2 thin films.
Authors: Kang, Jongmug1, Park, Seongbin2, Park, Hye Ryeon1, Lee, Seungbin2, Kim, Jin-Hyun3, Lee, Minjong4, Narayan, Dushyant M.3, Yoo, Jeong Gyu2, Park, Geon3,5,6, Kim, Harrison Sejoon3, Jung, Yong Chan3, Choi, Rino5,6, Kim, Jiyoung3,4, jiyoung.kim@utdallas.edu, Kim, Si Joon1,2, sijoon.kim@kangwon.ac.kr
Source: Applied Physics Letters; 3/8/2025, Vol. 126 Issue 10, p1-6, 6p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 183691095
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Thermal budget study to simultaneously achieve low-temperature (&lt;400 &#176;C) process and high endurance of ferroelectric Hf0.5Zr0.5O2 thin films.
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  Data: &lt;searchLink fieldCode=&quot;AU&quot; term=&quot;%22Kang%2C+Jongmug%22&quot;&gt;Kang, Jongmug&lt;/searchLink&gt;&lt;relatesTo&gt;1&lt;/relatesTo&gt;&lt;br /&gt;&lt;searchLink fieldCode=&quot;AU&quot; term=&quot;%22Park%2C+Seongbin%22&quot;&gt;Park, Seongbin&lt;/searchLink&gt;&lt;relatesTo&gt;2&lt;/relatesTo&gt;&lt;br /&gt;&lt;searchLink fieldCode=&quot;AU&quot; term=&quot;%22Park%2C+Hye+Ryeon%22&quot;&gt;Park, Hye Ryeon&lt;/searchLink&gt;&lt;relatesTo&gt;1&lt;/relatesTo&gt;&lt;br /&gt;&lt;searchLink fieldCode=&quot;AU&quot; term=&quot;%22Lee%2C+Seungbin%22&quot;&gt;Lee, Seungbin&lt;/searchLink&gt;&lt;relatesTo&gt;2&lt;/relatesTo&gt;&lt;br /&gt;&lt;searchLink fieldCode=&quot;AU&quot; term=&quot;%22Kim%2C+Jin-Hyun%22&quot;&gt;Kim, Jin-Hyun&lt;/searchLink&gt;&lt;relatesTo&gt;3&lt;/relatesTo&gt;&lt;br /&gt;&lt;searchLink fieldCode=&quot;AU&quot; term=&quot;%22Lee%2C+Minjong%22&quot;&gt;Lee, Minjong&lt;/searchLink&gt;&lt;relatesTo&gt;4&lt;/relatesTo&gt;&lt;br /&gt;&lt;searchLink fieldCode=&quot;AU&quot; term=&quot;%22Narayan%2C+Dushyant+M%2E%22&quot;&gt;Narayan, Dushyant M.&lt;/searchLink&gt;&lt;relatesTo&gt;3&lt;/relatesTo&gt;&lt;br /&gt;&lt;searchLink fieldCode=&quot;AU&quot; term=&quot;%22Yoo%2C+Jeong+Gyu%22&quot;&gt;Yoo, Jeong Gyu&lt;/searchLink&gt;&lt;relatesTo&gt;2&lt;/relatesTo&gt;&lt;br /&gt;&lt;searchLink fieldCode=&quot;AU&quot; term=&quot;%22Park%2C+Geon%22&quot;&gt;Park, Geon&lt;/searchLink&gt;&lt;relatesTo&gt;3,5,6&lt;/relatesTo&gt;&lt;br /&gt;&lt;searchLink fieldCode=&quot;AU&quot; term=&quot;%22Kim%2C+Harrison+Sejoon%22&quot;&gt;Kim, Harrison Sejoon&lt;/searchLink&gt;&lt;relatesTo&gt;3&lt;/relatesTo&gt;&lt;br /&gt;&lt;searchLink fieldCode=&quot;AU&quot; term=&quot;%22Jung%2C+Yong+Chan%22&quot;&gt;Jung, Yong Chan&lt;/searchLink&gt;&lt;relatesTo&gt;3&lt;/relatesTo&gt;&lt;br /&gt;&lt;searchLink fieldCode=&quot;AU&quot; term=&quot;%22Choi%2C+Rino%22&quot;&gt;Choi, Rino&lt;/searchLink&gt;&lt;relatesTo&gt;5,6&lt;/relatesTo&gt;&lt;br /&gt;&lt;searchLink fieldCode=&quot;AU&quot; term=&quot;%22Kim%2C+Jiyoung%22&quot;&gt;Kim, Jiyoung&lt;/searchLink&gt;&lt;relatesTo&gt;3,4&lt;/relatesTo&gt;, &lt;i&gt;jiyoung.kim@utdallas.edu&lt;/i&gt;&lt;br /&gt;&lt;searchLink fieldCode=&quot;AU&quot; term=&quot;%22Kim%2C+Si+Joon%22&quot;&gt;Kim, Si Joon&lt;/searchLink&gt;&lt;relatesTo&gt;1,2&lt;/relatesTo&gt;, &lt;i&gt;sijoon.kim@kangwon.ac.kr&lt;/i&gt;
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  Data: &lt;searchLink fieldCode=&quot;JN&quot; term=&quot;%22Applied+Physics+Letters%22&quot;&gt;Applied Physics Letters&lt;/searchLink&gt;; 3/8/2025, Vol. 126 Issue 10, p1-6, 6p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=183691095
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      – Type: doi
        Value: 10.1063/5.0256712
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 6
        StartPage: 1
    Titles:
      – TitleFull: Thermal budget study to simultaneously achieve low-temperature (<400 °C) process and high endurance of ferroelectric Hf0.5Zr0.5O2 thin films.
        Type: main
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            NameFull: Kang, Jongmug
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            NameFull: Park, Seongbin
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            NameFull: Park, Hye Ryeon
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            NameFull: Lee, Seungbin
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            NameFull: Kim, Jin-Hyun
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            NameFull: Narayan, Dushyant M.
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            NameFull: Park, Geon
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          Dates:
            – D: 08
              M: 03
              Text: 3/8/2025
              Type: published
              Y: 2025
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              Value: 126
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              Value: 10
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            – TitleFull: Applied Physics Letters
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