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Effect of Negative Substrate Bias Voltage and Pressure on the Structure and Properties of Tungsten Films Deposited by Magnetron Sputtering Technique.

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Title: Effect of Negative Substrate Bias Voltage and Pressure on the Structure and Properties of Tungsten Films Deposited by Magnetron Sputtering Technique.
Authors: Vassallo, Espedito1, espedito.vassallo@istp.cnr.it, Pedroni, Matteo1,2, Saleh, Miriam1,3, Minelli, Daniele1,4, Firpo, Giuseppe2,5, Miorin, Enrico3, Deambrosis, Silvia Maria3, Zin, Valentina3, Ripamonti, Dario3, Origo, Luca4,5
Source: Coatings (2079-6412); Mar2025, Vol. 15 Issue 3, p319, 18p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
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PubType: Academic Journal
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  Data: <searchLink fieldCode="JN" term="%22Coatings+%282079-6412%29%22">Coatings (2079-6412)</searchLink>; Mar2025, Vol. 15 Issue 3, p319, 18p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=184102598
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              Text: Mar2025
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