High surface quality Y2SiO5 silicate-crystal waveguides etched by chlorine-based inductive coupled plasma reactive ion etching.
Saved in:
| Title: | High surface quality Y2SiO5 silicate-crystal waveguides etched by chlorine-based inductive coupled plasma reactive ion etching. |
|---|---|
| Authors: | Talneau, A.1, anne.talneau@c2n.upsaclay.fr, Chan, M.2, Laourine, F.1, Maillard, F.1, Welinski, S.2, Berger, P.2, Ferrier, A.3,4 |
| Source: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Jul2025, Vol. 43 Issue 4, p1-8, 8p |
| Database: | Applied Science & Technology Source |
| ISSN: | 07342101 |
|---|---|
| DOI: | 10.1116/6.0004314 |
