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High surface quality Y2SiO5 silicate-crystal waveguides etched by chlorine-based inductive coupled plasma reactive ion etching.

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Title: High surface quality Y2SiO5 silicate-crystal waveguides etched by chlorine-based inductive coupled plasma reactive ion etching.
Authors: Talneau, A.1, anne.talneau@c2n.upsaclay.fr, Chan, M.2, Laourine, F.1, Maillard, F.1, Welinski, S.2, Berger, P.2, Ferrier, A.3,4
Source: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Jul2025, Vol. 43 Issue 4, p1-8, 8p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 186471913
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: High surface quality Y2SiO5 silicate-crystal waveguides etched by chlorine-based inductive coupled plasma reactive ion etching.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AU" term="%22Talneau%2C+A%2E%22">Talneau, A.</searchLink><relatesTo>1</relatesTo>, <i>anne.talneau@c2n.upsaclay.fr</i><br /><searchLink fieldCode="AU" term="%22Chan%2C+M%2E%22">Chan, M.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Laourine%2C+F%2E%22">Laourine, F.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Maillard%2C+F%2E%22">Maillard, F.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Welinski%2C+S%2E%22">Welinski, S.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Berger%2C+P%2E%22">Berger, P.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Ferrier%2C+A%2E%22">Ferrier, A.</searchLink><relatesTo>3,4</relatesTo>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Journal+of+Vacuum+Science+%26+Technology%3A+Part+A-Vacuums%2C+Surfaces+%26+Films%22">Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films</searchLink>; Jul2025, Vol. 43 Issue 4, p1-8, 8p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=186471913
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1116/6.0004314
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 8
        StartPage: 1
    Titles:
      – TitleFull: High surface quality Y2SiO5 silicate-crystal waveguides etched by chlorine-based inductive coupled plasma reactive ion etching.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Talneau, A.
      – PersonEntity:
          Name:
            NameFull: Chan, M.
      – PersonEntity:
          Name:
            NameFull: Laourine, F.
      – PersonEntity:
          Name:
            NameFull: Maillard, F.
      – PersonEntity:
          Name:
            NameFull: Welinski, S.
      – PersonEntity:
          Name:
            NameFull: Berger, P.
      – PersonEntity:
          Name:
            NameFull: Ferrier, A.
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 07
              Text: Jul2025
              Type: published
              Y: 2025
          Identifiers:
            – Type: issn-print
              Value: 07342101
          Numbering:
            – Type: volume
              Value: 43
            – Type: issue
              Value: 4
          Titles:
            – TitleFull: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films
              Type: main
ResultId 1