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Plasma dynamics of modulated pulsed power magnetron sputtered Cr target in an Ar-He atmosphere.

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Title: Plasma dynamics of modulated pulsed power magnetron sputtered Cr target in an Ar-He atmosphere.
Authors: Li, Y. G.1, ygli@dlut.edu.cn, Ouyang, G. Z.1, Cui, L.1, Zhou, Z. Y.1
Source: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Jul2025, Vol. 43 Issue 4, p1-9, 9p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 186471929
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Plasma dynamics of modulated pulsed power magnetron sputtered Cr target in an Ar-He atmosphere.
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PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=186471929
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1116/6.0004623
    Languages:
      – Code: eng
        Text: English
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      Pagination:
        PageCount: 9
        StartPage: 1
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      – TitleFull: Plasma dynamics of modulated pulsed power magnetron sputtered Cr target in an Ar-He atmosphere.
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            NameFull: Li, Y. G.
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            NameFull: Ouyang, G. Z.
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            NameFull: Cui, L.
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            – D: 01
              M: 07
              Text: Jul2025
              Type: published
              Y: 2025
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              Value: 43
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              Value: 4
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            – TitleFull: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films
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