Multidimensional validation of low-damage BCl[formula omitted]/Ar atomic layer etching for AlGaN/GaN HEMTs.
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| Title: | Multidimensional validation of low-damage BCl[formula omitted]/Ar atomic layer etching for AlGaN/GaN HEMTs. |
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| Authors: | Gao, Boxuan1, Zhu, Jiejie1, jjzhu@mail.xidian.edu.cn, Li, Mengdi1, Qin, Lingjie1, Qian, Yuchen1, Huang, Simei1, Li, Huilin1, Liao, Wanshuo1, Ma, Xiaohua1 |
| Source: | Materials Science in Semiconductor Processing; Nov2025, Vol. 198, pN.PAG-N.PAG, 1p |
| Database: | Applied Science & Technology Source |
| ISSN: | 13698001 |
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| DOI: | 10.1016/j.mssp.2025.109742 |
