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Multidimensional validation of low-damage BCl[formula omitted]/Ar atomic layer etching for AlGaN/GaN HEMTs.

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Title: Multidimensional validation of low-damage BCl[formula omitted]/Ar atomic layer etching for AlGaN/GaN HEMTs.
Authors: Gao, Boxuan1, Zhu, Jiejie1, jjzhu@mail.xidian.edu.cn, Li, Mengdi1, Qin, Lingjie1, Qian, Yuchen1, Huang, Simei1, Li, Huilin1, Liao, Wanshuo1, Ma, Xiaohua1
Source: Materials Science in Semiconductor Processing; Nov2025, Vol. 198, pN.PAG-N.PAG, 1p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 186591069
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Multidimensional validation of low-damage BCl[formula omitted]/Ar atomic layer etching for AlGaN/GaN HEMTs.
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  Data: <searchLink fieldCode="AU" term="%22Gao%2C+Boxuan%22">Gao, Boxuan</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Zhu%2C+Jiejie%22">Zhu, Jiejie</searchLink><relatesTo>1</relatesTo>, <i>jjzhu@mail.xidian.edu.cn</i><br /><searchLink fieldCode="AU" term="%22Li%2C+Mengdi%22">Li, Mengdi</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Qin%2C+Lingjie%22">Qin, Lingjie</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Qian%2C+Yuchen%22">Qian, Yuchen</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Huang%2C+Simei%22">Huang, Simei</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Li%2C+Huilin%22">Li, Huilin</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Liao%2C+Wanshuo%22">Liao, Wanshuo</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Ma%2C+Xiaohua%22">Ma, Xiaohua</searchLink><relatesTo>1</relatesTo>
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  Data: <searchLink fieldCode="JN" term="%22Materials+Science+in+Semiconductor+Processing%22">Materials Science in Semiconductor Processing</searchLink>; Nov2025, Vol. 198, pN.PAG-N.PAG, 1p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=186591069
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1016/j.mssp.2025.109742
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      – Code: eng
        Text: English
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        PageCount: 1
        StartPage: N.PAG
    Titles:
      – TitleFull: Multidimensional validation of low-damage BCl[formula omitted]/Ar atomic layer etching for AlGaN/GaN HEMTs.
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            NameFull: Gao, Boxuan
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            NameFull: Zhu, Jiejie
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            NameFull: Li, Mengdi
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            NameFull: Qin, Lingjie
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            NameFull: Qian, Yuchen
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            NameFull: Huang, Simei
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            NameFull: Li, Huilin
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            NameFull: Liao, Wanshuo
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            – D: 01
              M: 11
              Text: Nov2025
              Type: published
              Y: 2025
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              Value: 13698001
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              Value: 198
          Titles:
            – TitleFull: Materials Science in Semiconductor Processing
              Type: main
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