View in EDS

Biocompatible Porphyrin Derivatives Electron Beam and Extreme Ultraviolet Photoresists: High Resolution and High Etch Resistance.

Saved in:
Bibliographic Details
Title: Biocompatible Porphyrin Derivatives Electron Beam and Extreme Ultraviolet Photoresists: High Resolution and High Etch Resistance.
Authors: Wu, Yurui1, Zhang, Siliang1, Cui, Xuewen1, Cong, Xue1, Liu, Shuang1, Wang, Lei2, Guo, Xudong1, scoopguo@iccas.ac.cn, Hu, Rui1, Wang, Shuangqing1, g1704@iccas.ac.cn, Chen, Jinping2, Li, Yi2, Zhao, Jun3, Yang, Shumin3, Wu, Yanqing3, Yang, Guoqiang1, gqyang@iccas.ac.cn
Source: Advanced Materials Interfaces; 7/14/2025, Vol. 12 Issue 13, p1-11, 11p
Database: Applied Science & Technology Source
Description
ISSN:21967350
DOI:10.1002/admi.202500279