APA (7th ed.) Citation

Wu, Y., Zhang, S., Cui, X., Cong, X., Liu, S., Wang, L., . . . Yang, G. (2025). Biocompatible Porphyrin Derivatives Electron Beam and Extreme Ultraviolet Photoresists: High Resolution and High Etch Resistance. Advanced Materials Interfaces, 12(13), 1. https://doi.org/10.1002/admi.202500279

Chicago Style (17th ed.) Citation

Wu, Yurui, et al. "Biocompatible Porphyrin Derivatives Electron Beam and Extreme Ultraviolet Photoresists: High Resolution and High Etch Resistance." Advanced Materials Interfaces 12, no. 13 (2025): 1. https://doi.org/10.1002/admi.202500279.

MLA (9th ed.) Citation

Wu, Yurui, et al. "Biocompatible Porphyrin Derivatives Electron Beam and Extreme Ultraviolet Photoresists: High Resolution and High Etch Resistance." Advanced Materials Interfaces, vol. 12, no. 13, 2025, p. 1, https://doi.org/10.1002/admi.202500279.