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Biocompatible Porphyrin Derivatives Electron Beam and Extreme Ultraviolet Photoresists: High Resolution and High Etch Resistance.

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Title: Biocompatible Porphyrin Derivatives Electron Beam and Extreme Ultraviolet Photoresists: High Resolution and High Etch Resistance.
Authors: Wu, Yurui1, Zhang, Siliang1, Cui, Xuewen1, Cong, Xue1, Liu, Shuang1, Wang, Lei2, Guo, Xudong1, scoopguo@iccas.ac.cn, Hu, Rui1, Wang, Shuangqing1, g1704@iccas.ac.cn, Chen, Jinping2, Li, Yi2, Zhao, Jun3, Yang, Shumin3, Wu, Yanqing3, Yang, Guoqiang1, gqyang@iccas.ac.cn
Source: Advanced Materials Interfaces; 7/14/2025, Vol. 12 Issue 13, p1-11, 11p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 186745552
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Biocompatible Porphyrin Derivatives Electron Beam and Extreme Ultraviolet Photoresists: High Resolution and High Etch Resistance.
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PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=186745552
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        Value: 10.1002/admi.202500279
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              Text: 7/14/2025
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