P‐7.24: Strategies to develop highly reactive red photoresists via modulation of the exposure and developing processes.
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| Title: | P‐7.24: Strategies to develop highly reactive red photoresists via modulation of the exposure and developing processes. |
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| Authors: | Li, Ji1,2,3, Fang, Hao3, Zhang, Xia3, Liu, Xiao3, Meng, Hong1,2 |
| Source: | SID Symposium Digest of Technical Papers; Jun2025 Supplement 1, Vol. 56, p1260-1265, 6p |
| Database: | Applied Science & Technology Source |
| ISSN: | 0097966X |
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| DOI: | 10.1002/sdtp.19057 |
