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P‐7.24: Strategies to develop highly reactive red photoresists via modulation of the exposure and developing processes.

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Title: P‐7.24: Strategies to develop highly reactive red photoresists via modulation of the exposure and developing processes.
Authors: Li, Ji1,2,3, Fang, Hao3, Zhang, Xia3, Liu, Xiao3, Meng, Hong1,2
Source: SID Symposium Digest of Technical Papers; Jun2025 Supplement 1, Vol. 56, p1260-1265, 6p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 186836046
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PubType: Academic Journal
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      – Type: doi
        Value: 10.1002/sdtp.19057
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      – Code: eng
        Text: English
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        PageCount: 6
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      – TitleFull: P‐7.24: Strategies to develop highly reactive red photoresists via modulation of the exposure and developing processes.
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            NameFull: Li, Ji
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            NameFull: Zhang, Xia
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              Text: Jun2025 Supplement 1
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              Y: 2025
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              Value: 56
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