Characteristics of inductively coupled plasma radio frequency ion sources in commercial ion implanters.
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| Title: | Characteristics of inductively coupled plasma radio frequency ion sources in commercial ion implanters. |
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| Authors: | Hwang, Jong Jin1, Sim, Hyo Jun1, Moon, Seung Jae1, smoon@hanyang.ac.kr |
| Source: | Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Jul2025, Vol. 43 Issue 4, p1-8, 8p |
| Database: | Applied Science & Technology Source |
| ISSN: | 21662746 |
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| DOI: | 10.1116/6.0004560 |
