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Enhancing Wafer Notch Detection for Ion Implantation: Optimized YOLOv8 Approach with Global Attention Mechanism.

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Bibliographic Details
Title: Enhancing Wafer Notch Detection for Ion Implantation: Optimized YOLOv8 Approach with Global Attention Mechanism.
Authors: Zhang, Yuanhao1, Sim, Hyo Jun1, Hwang, Jong Jin1, Moon, Seung Jae, smoon@hanyang.ac.kr
Source: Applied Sciences (2076-3417); Aug2025, Vol. 15 Issue 16, p9122, 17p
Database: Applied Science & Technology Source
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ISSN:20763417
DOI:10.3390/app15169122