APA (7th ed.) Citation

Zhang, Y., Sim, H. J., Hwang, J. J., & Moon, S. J. (2025). Enhancing Wafer Notch Detection for Ion Implantation: Optimized YOLOv8 Approach with Global Attention Mechanism. Applied Sciences (2076-3417), 15(16), 9122. https://doi.org/10.3390/app15169122

Chicago Style (17th ed.) Citation

Zhang, Yuanhao, Hyo Jun Sim, Jong Jin Hwang, and Seung Jae Moon. "Enhancing Wafer Notch Detection for Ion Implantation: Optimized YOLOv8 Approach with Global Attention Mechanism." Applied Sciences (2076-3417) 15, no. 16 (2025): 9122. https://doi.org/10.3390/app15169122.

MLA (9th ed.) Citation

Zhang, Yuanhao, et al. "Enhancing Wafer Notch Detection for Ion Implantation: Optimized YOLOv8 Approach with Global Attention Mechanism." Applied Sciences (2076-3417), vol. 15, no. 16, 2025, p. 9122, https://doi.org/10.3390/app15169122.