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Water-Developable PFAS-Free Glycan-Derived Positive Photoresist Materials for Environmentally Friendly Lithography.

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Bibliographic Details
Title:	Water-Developable PFAS-Free Glycan-Derived Positive Photoresist Materials for Environmentally Friendly Lithography.
Authors:	Hachikubo, Yuna¹, Hayashi, Hiryu^1,2, Ando, Mano^1,3, Morita, Mayu¹, Oshima, Misaki^1,2, Hashim, Abdul Manaf^2,3, Azhan, Nurul Hanis², Ota, Takayuki³, Takei, Satoshi¹, takeis@pu-toyama.ac.jp
Source:	Coatings (2079-6412); Oct2025, Vol. 15 Issue 10, p1228, 14p
Database:	Applied Science & Technology Source
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Description
ISSN:	20796412
DOI:	10.3390/coatings15101228