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Water-Developable PFAS-Free Glycan-Derived Positive Photoresist Materials for Environmentally Friendly Lithography.

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Title: Water-Developable PFAS-Free Glycan-Derived Positive Photoresist Materials for Environmentally Friendly Lithography.
Authors: Hachikubo, Yuna1, Hayashi, Hiryu1,2, Ando, Mano1,3, Morita, Mayu1, Oshima, Misaki1,2, Hashim, Abdul Manaf2,3, Azhan, Nurul Hanis2, Ota, Takayuki3, Takei, Satoshi1, takeis@pu-toyama.ac.jp
Source: Coatings (2079-6412); Oct2025, Vol. 15 Issue 10, p1228, 14p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 188956996
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Water-Developable PFAS-Free Glycan-Derived Positive Photoresist Materials for Environmentally Friendly Lithography.
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  Data: <searchLink fieldCode="AU" term="%22Hachikubo%2C+Yuna%22">Hachikubo, Yuna</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Hayashi%2C+Hiryu%22">Hayashi, Hiryu</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AU" term="%22Ando%2C+Mano%22">Ando, Mano</searchLink><relatesTo>1,3</relatesTo><br /><searchLink fieldCode="AU" term="%22Morita%2C+Mayu%22">Morita, Mayu</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Oshima%2C+Misaki%22">Oshima, Misaki</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AU" term="%22Hashim%2C+Abdul+Manaf%22">Hashim, Abdul Manaf</searchLink><relatesTo>2,3</relatesTo><br /><searchLink fieldCode="AU" term="%22Azhan%2C+Nurul+Hanis%22">Azhan, Nurul Hanis</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Ota%2C+Takayuki%22">Ota, Takayuki</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Takei%2C+Satoshi%22">Takei, Satoshi</searchLink><relatesTo>1</relatesTo>, <i>takeis@pu-toyama.ac.jp</i>
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  Data: <searchLink fieldCode="JN" term="%22Coatings+%282079-6412%29%22">Coatings (2079-6412)</searchLink>; Oct2025, Vol. 15 Issue 10, p1228, 14p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=188956996
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      – Type: doi
        Value: 10.3390/coatings15101228
    Languages:
      – Code: eng
        Text: English
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      Pagination:
        PageCount: 14
        StartPage: 1228
    Titles:
      – TitleFull: Water-Developable PFAS-Free Glycan-Derived Positive Photoresist Materials for Environmentally Friendly Lithography.
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            NameFull: Hachikubo, Yuna
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              M: 10
              Text: Oct2025
              Type: published
              Y: 2025
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              Value: 15
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              Value: 10
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